LAM 810-002895-002

Product Introduction:
The LAM 810-002895-002 is a high-precision mass flow controller module utilized in LAM semiconductor equipment. It provides exact regulation of process gases, which is essential for achieving precise film thickness and etch rates.

Category:

Description

LAM 810-002895-002

Functional Features:

  • Precision Regulation: Delivers highly accurate and repeatable gas flow rates with minimal drift.
  • Fast Response Time: Rapidly adjusts flow to accommodate dynamic process recipe changes.
  • Corrosion Resistance: Wetted parts are constructed from materials resistant to aggressive semiconductor process gases.

Application Scenarios:
Used in gas delivery systems for plasma etching, CVD, and atomic layer deposition (ALD) tools.

Performance Parameters:

  • Flow Accuracy: Typically ±1% of full scale or better.
  • Response Time: Millisecond-level response to setpoint changes.

Material Composition:
Features stainless steel wetted parts, elastomer seals compatible with corrosive gases, and precision solenoid valves.

Structural Characteristics:
Compact, integrated module with electrical and pneumatic interfaces designed for easy replacement and maintenance.

Working Principle:
Compares the actual gas flow (measured by a thermal or differential pressure sensor) against the desired setpoint, and dynamically adjusts a proportional valve to correct any deviation.

Installation Requirements:
Ensure gas lines are completely clean and purged before installation. Verify gas type compatibility with the module’s wetted materials.

Usage Precautions:
Do not exceed the maximum rated pressure. Perform regular leak checks and zero-calibration to maintain process integrity.